发明名称 |
Method for fabricating an imprint mold structure |
摘要 |
The present invention is related to a method for fabricating an imprint mold which can be used in the field of nano-imprint lithography. Firstly, a diamond film and a photoresist film are successively formed onto a substrate; wherein the photoresist film is more capable of anticorrosion than the diamond film. Then an energy beam lithography system is provided to make the photoresist film form a photoresist mask with particularly arranged patterns. Because of the etching selectivity between the diamond film and the photoresist film, on the surface of the diamond film a pattern can be easily formed with recessions and protrusions according to the photoresist mask by dry etching method.
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申请公布号 |
US7309515(B2) |
申请公布日期 |
2007.12.18 |
申请号 |
US20040770526 |
申请日期 |
2004.02.04 |
申请人 |
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE |
发明人 |
TSAI HUNG-YIN;WU CHIH-HUNG;CHENG CHIH-YUNG |
分类号 |
B05D3/00;B32B9/00;G03F7/00 |
主分类号 |
B05D3/00 |
代理机构 |
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代理人 |
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地址 |
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