| 摘要 |
A system for removing dust in the inner part of a semiconductor apparatus is provided to remove the dust efficiently by installing an exhaust fan and controlling a speed of an elevation fan and the exhaust fan. An elevation fan(100) is installed within a horizontal supporter to induce dust which are generated in the horizontal supporter to a vertical supporter. A plurality of exhaust fans(200) are installed within the vertical supporter. A control part(300) controls a rotation speed of the elevation fan and the exhaust fans respectively.
|
