发明名称 Lithographic apparatus and device manufacturing method
摘要 A moveable member is provided which extends the top surface of a substrate table, in plan, beyond a bumper which protects the substrate table during collision. The moveable member may be retracted to a retracted position in which it no longer extends beyond the bumper. In this way it is possible to move two substrate tables together and to allow the retractable member to pass under a liquid supply system which normally provides liquid between the projection system and a substrate without turning off of the liquid supply system.
申请公布号 US7310132(B2) 申请公布日期 2007.12.18
申请号 US20060377636 申请日期 2006.03.17
申请人 ASML NETHERLANDS B.V. 发明人 VAN DER SCHOOT HARMEN KLAAS;LOOPSTRA ERIK ROELOF;JACOBS FRANSICUS MATHIJS;GEELEN GODFRIED KATHARINA HUBERTUS FRANCISCUS
分类号 G03B27/58 主分类号 G03B27/58
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