发明名称 Lithographic apparatus and position measuring method
摘要 In a lithographic apparatus, a measurement of the position of an object in an ambient space by an object position measuring system which is influenced by pressure variations in the ambient space, is corrected by an accurate measurement of the pressure in the ambient space. A pressure difference is measured between a pressure in a reference pressure volume and an ambient pressure in an ambient space. An absolute pressure in the reference pressure volume is added to the pressure difference to determine a change of pressure in the ambient space. Alternatively, the pressure difference is integrated over time and a determined change of pressure in the reference pressure volume is added to the pressure difference to determine a change of pressure in the ambient space.
申请公布号 US7310130(B2) 申请公布日期 2007.12.18
申请号 US20040957755 申请日期 2004.10.05
申请人 ASML NETHERLANDS B.V. 发明人 EUSSEN EMIEL JOZEF MELANIE;VAN-EMPEL TJARKO ADRIAAN RUDOLF;PRIL WOUTER ONNO
分类号 G03B27/42;G01B11/00 主分类号 G03B27/42
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