发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
The projection system of a lithographic apparatus has a plurality of pupil planes and at least two irises provided in respective pupil planes each optimized to provide a high degree of NA uniformity over a respective NA range so that a high degree of NA uniformity can be provided over a wide range of NA settings.
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申请公布号 |
US7310131(B2) |
申请公布日期 |
2007.12.18 |
申请号 |
US20050194764 |
申请日期 |
2005.08.02 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JASPER JOHANNES CHRISTIAAN MARIA |
分类号 |
G03B27/72;G02B9/00;G03B27/42 |
主分类号 |
G03B27/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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