发明名称 |
Use of overlay diagnostics for enhanced automatic process control |
摘要 |
Disclosed are apparatus and methods for obtaining and analyzing various unique metrics or "target diagnostics" from one or more semiconductor overlay targets. In one embodiment, an overlay target is measured to obtain one or both of two specific types of target diagnostic information, systematic error metrics and/or random noise metrics. The systematic error metrics generally quantify asymmetries of the overlay target, while the random noise metrics quantify and/or qualify the spatial noise that is proximate to or associated with the overlay target.
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申请公布号 |
US7310789(B2) |
申请公布日期 |
2007.12.18 |
申请号 |
US20060510147 |
申请日期 |
2006.08.24 |
申请人 |
KLA-TENCOR TECHNOLOGIES CORPORATION |
发明人 |
SELIGSON JOEL L.;GHINOVKER MARK;ROBINSON JOHN;IZIKSON PAVEL;ADEL MICHAEL E.;SIMKIN BORIS;TULIPMAN DAVID;LEVINSKI VLADIMIR |
分类号 |
G06F17/50;G03F7/20 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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