发明名称 APPARATUS FOR SUPPLYING IONS TO A SUBSTRATE
摘要 An ion supplying apparatus is provided to reduce the time to repair an ion spraying unit by rotating a member where the ion spraying unit is installed. An ion supplying apparatus(100) includes a stacker(10), an ion spraying unit(20), and a rotating member(30). Substrates are stacked in the stacker. The ion spraying unit has an ion spraying hole which sprays ions between the substrates stacked in the stacker. The rotating member rotates the ion spraying unit to make the ion spraying hole face the substrates or the opposite direction of the substrates. The stacker includes pivot members(6,7) pivot-coupled with a first end of the rotating member and a second end facing the first end.
申请公布号 KR20070118410(A) 申请公布日期 2007.12.17
申请号 KR20060052504 申请日期 2006.06.12
申请人 LG.PHILIPS LCD CO., LTD. 发明人 KIM, JONG WON
分类号 H05F3/00;H05F3/04;H05F3/06 主分类号 H05F3/00
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