Photolithography device has loading or unloading unit for loading or unloading substrate, and coating line for applying photo resist on substrate, which is exposed by exposure line, where development line develops exposed substrate

摘要

The device comprises a loading or unloading unit for loading or unloading of a substrate, and a coating line for applying photo resist on the substrate, which is exposed by an exposure line. A development line is used to develop the exposed substrate. A transfer line provides temporary storage to the substrate and loads the substrate on the exposure line. The transfer line provides temporary storage to the exposed substrate and loads the exposed substrate on the development line. An independent claim is also included for a photolithography method, which involves loading a substrate.