发明名称 APPARATUS FOR PROCESSING A SUBSTRATE
摘要 A substrate processing apparatus is provided to observe an interior of a process chamber easily, regardless of a position or size of a view port, by installing a camera unit in the view port. A substrate processing apparatus includes a process chamber(200) processing a substrate(101) and a view port(400) penetrating one sidewall of the process chamber. A camera unit(500) is installed in the view port to take a photo of an interior of the process chamber. An opening/closing unit(410) is installed in the process chamber to open and close the view port. The opening/closing unit has a driving source, a frame installed in an inner sidewall of the chamber and a shutter moved along the frame to open and close the view port.
申请公布号 KR100783072(B1) 申请公布日期 2007.12.07
申请号 KR20060135374 申请日期 2006.12.27
申请人 SEMES CO., LTD. 发明人 MUN, SANG MIN
分类号 H01L21/3065;H01L21/02 主分类号 H01L21/3065
代理机构 代理人
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