发明名称 PLASMA PROCESSING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To improve the efficiency of atmospheric-pressure plasma processing without installing an extra apparatus by maintaining a gas atmosphere nearby plasma processors. <P>SOLUTION: The apparatus includes the plasma processors 5a and 5b which plasma-process a work 1, a conveying mechanism 2 which moves the plasma processors 5a and 5b relatively to the work 1, and gas curtain mechanisms 3a and 3b, and 3c and 3d provided on work entrance sides and work exit sides of the plasma processors 5a and 5b, respectively. At least, the gas curtain mechanisms 3a and 3b are blown out on the entrance sides for the work 1 blow out gas capable of heating the work 1. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007318037(A) 申请公布日期 2007.12.06
申请号 JP20060148633 申请日期 2006.05.29
申请人 SHARP CORP 发明人 TANAKA YASUHIRO;YAMAMOTO TATSUSHI;TAKAHASHI DAISUKE;OKAMOTO NAOKO
分类号 H01L21/3065;C23C16/505;C23C16/54;H01L21/304;H05H1/24 主分类号 H01L21/3065
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