| 摘要 |
An illumination system for a microlithography projection exposure apparatus has a light distribution device ( 21 ), which generates a two-dimensional intensity distribution from the light from a primary light source, for example a laser, in a first surface ( 25 ) of the illumination system. A fly's eye condenser ( 55 ) having a first and a second raster arrangement ( 40 ) of optical elements serves as a light mixing device for homogenizing the illumination in the illumination field of the illumination system. The fly's eye condenser has a first raster arrangement ( 35 ) of first raster elements ( 36 ) and also a second raster arrangement ( 40 ) of second raster elements ( 41 ). The light distribution device comprises at least one diffractive optical element ( 21 ) for generating an angular distribution whose far field has separate or contiguous luminous zones which are coordinated with the form and size of the first raster elements ( 36 ).
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