发明名称 PATTERN PROJECTING LIGHT SOURCE AND COMPOUND EYE DISTANCE MEASURING DEVICE
摘要 <p>Disclosed is a pattern projection light source including: a light source (2a); a plurality of mask regions (5) having light transmitting portions where the light from the light source passes are formed with a predetermined pattern; and a plurality of lenses (7) each forming an image of a predetermined pattern of the light transmitting portion at a predetermined distance. The light source (2a), the mask regions, and the lenses (7) are arranged in this order. Since the pattern projection light source includes a plurality of projection optical systems each having a mask region and a lens, it is possible to realize a small-size and thin pattern projection light source. Moreover, by arranging a plurality of lenses, it is possible to enlarge the pattern image formation range. Furthermore, it is possible to form a clear pattern image of the light transmitting portions on an object.</p>
申请公布号 WO2007138904(A1) 申请公布日期 2007.12.06
申请号 WO2007JP60336 申请日期 2007.05.21
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.;IMAMURA, NORIHIRO 发明人 IMAMURA, NORIHIRO
分类号 G01C3/06;F21S2/00;F21S8/04;F21V5/00;G02B7/30 主分类号 G01C3/06
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