| 摘要 |
PROBLEM TO BE SOLVED: To provide a management method for a water-based resist stripping liquid and a management device for the method by which the concentration of a stripping liquid is always maintained within a given range, the period of exchanging for a new liquid is extended, and the running cost is decreased. SOLUTION: First, changes in concentrations of a plurality of components included in a water-based photoresist stripping liquid are stored as relative relations of changes in conductivity and ultrasonic wave propagation velocity corresponding to the above changes (step S1). Next, upon stripping a resist, a specified component in the plurality of components in the stripping liquid is selected as a representing component of the stripping liquid (step S2). The conductivity and ultrasonic wave propagation velocity of the representative component are measured (step S3); whether the measured values are within the respective preliminarily stored management ranges of the relative relation of the representative component or not is judged (step S4); and when the values are within the ranges, this procedure is ended, or when the values are out of the ranges, the control process is continued until deviations are eliminated (steps S5 and S6). COPYRIGHT: (C)2008,JPO&INPIT
|
