发明名称 |
SINGLE COMPONENT PAD BACKER FOR POLISHING HEAD OF AN ORBITAL CHEMICAL MECHANICAL POLISHING MACHINE AND METHOD THEREFOR |
摘要 |
A pad backer for a polishing head of an orbital chemical mechanical polishing (CMP) machine is formed of a flexible pad. A plurality of holes are formed through the flexible pad. The holes are used to accommodate tile flow of a polishing liquid from the underside of the flexible pad. A plurality of grooves are formed on a backside of the flexible pad for transferring a liquid during the polishing process. |
申请公布号 |
WO2005123333(A3) |
申请公布日期 |
2007.12.06 |
申请号 |
WO2005US19938 |
申请日期 |
2005.06.07 |
申请人 |
PINDER, HARVEY |
发明人 |
PINDER, HARVEY |
分类号 |
B24B29/00;B24B21/18;B24B37/10;B24B37/26;B24B37/30;B24D11/00;B24D11/02 |
主分类号 |
B24B29/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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