| 摘要 |
<p>An exposure method suitable for forming a fine pattern constituting an electronic device, has high resolution and high cost performance. Two diffraction gratings (P1, P2) are arranged in a light path in series by permitting a wafer (W) or the like constituting the electronic device and the two diffraction gratings (P1, P2) to be at prescribed intervals. A contrast pattern of interference fringes generated by the diffraction gratings (P1, P2) is exposed on the wafer (W) or the like. The exposure is performed while changing a positional relationship between the wafer (W) or the like and the diffraction gratings (P1, P2) as needed.</p> |
