| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an analysis method of metal impurity in TiCl<SB>4</SB>used as a raw material in a method of producing high purity titanium, and the method of producing the high purity titanium using this method for process management. <P>SOLUTION: (1) The concentration of the metal impurity in TiCl<SB>4</SB>is measured by an ICP-MS. When this measurement is performed after making TiCl<SB>4</SB>react with sulphuric acid, removing chlorine component by evaporation and drying, further adding hydrofluoric acid solution, and removing Ti component through an anion exchange column, the concentration of V as the impurity can be measured in high accuracy of 0.015 ppm of minimum limit of determination. (2) TiCl<SB>4</SB>is sampled, the concentration of the metal impurity (especially, V) in TiCl<SB>4</SB>is measured in the method of (1), the measurement result is fed back to the producing process, and the producing process is controlled so that the concentration of the metal impurity in the product is a predetermined value or lower. High purity titanium can be stably produced. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
