发明名称 |
Manufacturing method of silicon nozzle plate and manufacturing method of inkjet head |
摘要 |
A manufacturing method of a silicon nozzle plate, having; a film forming process to provide the film representing an etching mask for etching the silicon substrate on a surface of the silicon substrate; a pattern film forming to form a pattern film by partially removing the film based on a nozzle hole forming patter and an outer shape forming pattern; a silicon substrate etching process to form nozzle holes based on the nozzle hole forming pattern representing the etching mask, and to form a half etching portion at least in a part of the silicon substrate based on the outer shape forming patter; and a silicon substrate separating process to separate the silicon substrate by splitting along the half etching portion.
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申请公布号 |
US2007278181(A1) |
申请公布日期 |
2007.12.06 |
申请号 |
US20070805891 |
申请日期 |
2007.05.25 |
申请人 |
TSUBOI KAZUHIKO;HIRAI TOHRU |
发明人 |
TSUBOI KAZUHIKO;HIRAI TOHRU |
分类号 |
C03C25/68;B44C1/22 |
主分类号 |
C03C25/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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