发明名称 |
METHOD AND APPARATUS TO IMPROVE LITHOGRAPHY THROUGHPUT |
摘要 |
The present disclosure provides a lithography apparatus with improved lithography throughput. The lithography apparatus includes a first lens system; a first substrate stage configured to receive a first radiation energy from the first lens system, and designed operable to move a substrate during an exposing process; a second lens system, having a higher resolution than that of the first lens system; and a second substrate stage approximate to the first substrate stage and configured to receive a second radiation energy from the second lens system, and designed operable to receive the substrate from the first substrate stage and move the substrate.
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申请公布号 |
US2007278424(A1) |
申请公布日期 |
2007.12.06 |
申请号 |
US20060421590 |
申请日期 |
2006.06.01 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
LIN CHIN-HSIANG;PENG JUI-CHUNG;CHEN YUNG-CHENG;LIN SHY-JAN |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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