发明名称 |
EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD |
摘要 |
<p>liquid-immersion space forming member (70) for forming a liquid immersion space by filling an optical path space (K1) of exposure light (EL) with a first liquid (LQ); and a temperature regulating mechanism (60) for suppressing the temperature change of the liquid-immersion space forming member (70) accompanying the release of formation of the liquid immersion space.</p> |
申请公布号 |
KR20070115861(A) |
申请公布日期 |
2007.12.06 |
申请号 |
KR20077003842 |
申请日期 |
2006.04.17 |
申请人 |
NIKON CORPORATION |
发明人 |
NAGASAKA HIROYUKI;SHIRAISHI KENICHI;FUJIWARA TOMOHARU;OWA SOICHI;MIWA AKIHIRO |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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