发明名称 |
Slurry composition, method of polishing an object layer and method of manufacturing a non-volatile memory device using the slurry composition |
摘要 |
Methods of polishing an object layer and for manufacturing a non-volatile memory device that incorporates such a polished object layer using a specially formulated slurry composition are disclosed. The slurry compositions include a ceria abrasive, a nonionic surfactant having a hydrophilic-lipophilic balance (HLB) value in a range of about 12 to about 17, and water. The nonionic surfactant is selected such that it may be adsorbed onto a hydrophobic layer to protect the hydrophobic layer from the ceria abrasive during a polishing operation. The slurry compositions may have a relatively high polishing rate for a hydrophilic layer and at the same time a relatively low polishing rate for a hydrophobic layer. Thus, the slurry compositions may be applied during a process for polishing the hydrophilic layer using the hydrophobic layer as a polishing stop layer.
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申请公布号 |
US2007281486(A1) |
申请公布日期 |
2007.12.06 |
申请号 |
US20070809672 |
申请日期 |
2007.06.01 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HAN EUI-JIN;KIM NAM-SOO;AHN BONG-SU;LEE DONG-JUN |
分类号 |
H01L21/461;H01L21/302 |
主分类号 |
H01L21/461 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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