| 摘要 |
<p>An exposing apparatus and an exposure method are provided to reduce a tact time and to precisely expose a mask pattern on a substrate by using a first substrate stage, a second substrate stage, and a vibration absorber. A mask stage(10) maintains a mask. A main bed(19) is located on a lower portion of the mask stage. A first sub-bed(21) and a second sub-bed(22) are arranged on a side of the main bed. A first substrate stage(11) is movable between the main bed and the first sub-bed. A second substrate stage(12) is movable between the main bed and the second sub-bed. An irradiating apparatus irradiates light for use in a pattern exposure through the mask to a substrate supported on the first and the second substrate stages located on the main bed. A vibration absorber prevents vibration generated in the first and the second sub-beds from being transmitted to the main bed.</p> |
