发明名称 SEMICONDUCTOR TRANSISTORS WITH EXPANDED TOP PORTIONS OF GATES
摘要 A semiconductor transistor (100) with an expanded top portion of a gate and a method for forming the same. The semiconductor transistor (100) with an expanded top portion of a gate includes (a) a semiconductor region (110)which includes a channel region and first and second source/drain regions (840 and 850); the channel region is disposed between the first and second source/drain regions (840 and 850), (b) a gate dielectric region (411) in direct physical contact with the channel region, and (c) a gate electrode region (510) which includes a top portion (512) and a bottom portion (515). The bottom portion (515) is in direct physical contact with the gate dielectric region (411). A first width (517) of the top portion (512) is greater than a second width (516) of the bottom portion (515). The gate electrode region (510) is electrically insulated from the channel region by the gate dielectric region (411).
申请公布号 WO2007082266(A3) 申请公布日期 2007.12.06
申请号 WO2007US60390 申请日期 2007.01.11
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION;ANDERSON, BRENT, A.;CHAN, VICTOR, W., C.;NOWAK, EDWARD, J. 发明人 ANDERSON, BRENT, A.;CHAN, VICTOR, W., C.;NOWAK, EDWARD, J.
分类号 H01L21/76 主分类号 H01L21/76
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