| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and apparatus for obtaining the correction quantity of the exposure conditions comparatively simply and an aligner having such detector. <P>SOLUTION: The method of obtaining the correction quantity of the exposure conditions at least including either the focus quantity or the exposure quantity in the aligner for exposing a resist comprises a step of storing a plurality of combinations of first image information of a resist pattern obtained under the exposure conditions with the exposure conditions; and a step of obtaining the correlation values of the individual first image information with second image information of a resist pattern obtained under a specified exposure condition, as the exposure condition to obtain the correction quantity of the specified exposure condition. <P>COPYRIGHT: (C)2008,JPO&INPIT |
