发明名称 PROJECTION EXPOSURE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a projection exposure device the installation volume of which is not larger than that of a conventional device by suppressing sizes in the horizontal and vertical directions of the device. <P>SOLUTION: The projection exposure device 20 projects a pattern of a mask M onto a work F in a film tape form by exposure with irradiation light by using an exposure stage 24 disposed in a vertical direction, and the exposure device is equipped with a conveyance mechanism 25 to move the work in the vertical direction to the exposure stage and a projection optical mechanism having a Dyson optical system 23 disposed at an adjoining position of the conveyance mechanism over the exposure stage. The Dyson optical system is disposed in such a manner that the optical axis of irradiation light incident to the Dyson optical system and the optical axis of the irradiation light exiting from the Dyson optical system are orthogonal to the work on the exposure stage. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007316589(A) 申请公布日期 2007.12.06
申请号 JP20070002918 申请日期 2007.01.11
申请人 ORC MFG CO LTD 发明人 SATO HITOSHI;NAKAZAWA AKIRA;MOMOSE KATSUMI
分类号 G03F9/00 主分类号 G03F9/00
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