| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve the following problem wherein: a lower aligning mark can not be detected; and a pattern is hardly formed, when a metal film not transparent to visible light is interposed between the lower aligning mark and a photoresist. <P>SOLUTION: A configuration is set in such a manner that insulating films are located below the aligning mark, the aligning mark formed of an aligning mark and the multilayered insulating films having an enhanced level difference is previously formed in a mark hole in a self-aligned manner, and an object metal film is formed thereon. The metal film itself has a level difference reflecting the aligning mark, so that an exact aligning process can be carried out. <P>COPYRIGHT: (C)2008,JPO&INPIT |
