| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for detecting and measuring irregularities in the arrangement of a minute regular pattern, by which irregularities in the arrangement of a regularly arranged pattern in a material, a device, or the like such as a photonic crystal, a pixel array wherein the pitch of the regularly arranged pattern tends to be much smaller, can be detected and measured more easily, accurately, in a short period of time, and over a desired range. SOLUTION: An object to be detected having a minute regular pattern, is irradiated with energy lines by a predetermined scanning pattern, and moire fringes are formed by differences in the amounts of generated secondary electrons, the amounts of reflected particles, the amounts of generated secondary ions, or amounts of x-rays generated when irradiated with the energy lines. Based on the moire fringes, the situation of deformation of the regular pattern which the object to be detected has are observed within a predetermined range at a time, and local irregularities in arrangement are detected or measured. COPYRIGHT: (C)2008,JPO&INPIT
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