| 摘要 |
A device for cleaning a substrate such as a fabric comprises a reservoir ( 3 ) for storing a fabric cleaning fluid ( 9 ), a scrubbing member ( 5 ) for scrubbing the fabric, the scrubbing member ( 5 in fluid communication with the reservoir ( 3 ). The scrubbing member ( 5 ) comprises one or more dispensing orifices ( 7 ) and a movable platform ( 11 ) for forcing said cleaning fluid ( 9 ) to exit from the reservoir ( 3 ) to the scrubber member ( 5 ), where it is exposed on an exterior portion of the scrubber member via said dispensing orifices ( 7 ), for cleaning purposes.
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