| 摘要 |
<p>[PROBLEMS] To expose a desired exposure image at a desired position on a substrate regardless of deformation of the substrate in the exposure method for exposing the exposure image by relatively shifting an exposure head with respect to the substrate and successively forming exposure points on the substrate according to the shift. [MEANS FOR SOLVING PROBLEMS] A plurality of reference marks (12a) present at predetermined positions on the substrate (12) are detected by a camera (26). The detection position information indicating the position of the reference mark (12a) is acquired by detection position information acquisition means (52). According to the detection position information, exposure path information indicating the actual exposure path of each micro mirror (38) of the exposure head (30) on the substrate (12) is acquired by exposure path information acquisition means (54). Exposure point data acquisition means (56) acquires exposure point data corresponding to the exposure path information for each of the micro mirrors (38) from the exposure image data. According to the acquired exposure point data, the substrate (12) is exposed by the exposure head (30).</p> |
