APPARATUS FOR MANUFACTURING OPC MASK USING ELECTRON BEAM

摘要

An apparatus for manufacturing an OPC(Optical Proximity Correction) mask using electron beam is provided to easily manufacture a complicated pattern by freely controlling the dimension of the electron beam using a defocusing method to form a compensation pattern. A mask main frame(100) is placed on a mask support(101). An electron beam radiating unit(103) is located on a center upper portion of the mask support. The electron beam radiating unit has an electron source, an electron beam focusing unit, and an electron beam control unit. The electron beam source generates an electron beam so that the electron beam is radiated to the mask main frame. The electron beam focusing unit focuses the electron beam. The electron beam control unit controls a focusing degree of the electron beam to defocus the electron beam. A control unit is mounted on the electron radiating unit. The control unit calculates dimension of the electron beam to control the electron beam control unit.