| 摘要 |
PROBLEM TO BE SOLVED: To provide a developing device, a development processing method, and a development processing program capable of reducing the consumption of developer and shortening a development processing time irrespective of kinds of resist materials or the shapes of resist patterns, and to provide a computer-readable recorded medium with the program recorded thereon. SOLUTION: There are included a step of horizontally holding a substrate W and rotating the same around a perpendicular axis at a predetermined rotating speed and a step of intermittently supplying the developer D onto a central section of the substrate W from the outlet 41 of a developer nozzle 4a disposed as opposed to the surface of the substrate W to intermittently supply the developer D onto the central section of the substrate W, wherein an intermittent time and a substrate rotating speed in the intermittent time are set so as to allow the developer D supplied to the substrate W not to be dried. COPYRIGHT: (C)2008,JPO&INPIT |
