| 摘要 |
PROBLEM TO BE SOLVED: To provide a device and a method for measuring uniformity in the discharge in the widthwise direction of photoresist discharged from the slit nozzle of a substrate-coating apparatus. SOLUTION: The measuring device of uniformity in the lateral discharge of the slit nozzle has a plurality of hydraulic measurement units having a detection surface that opposes the discharge port of the slit nozzle. The hydraulic measurement units are arranged in the widthwise direction of the slit nozzle. COPYRIGHT: (C)2008,JPO&INPIT
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