发明名称 |
Method for CMP with variable down-force adjustment |
摘要 |
The present invention relates to a method for performing chemical mechanical polishing. A high down-force step is performed. A low down-force step is performed. At least one of the down-force steps is modified, based on if one of the down-force steps exceeds an acceptable tolerance associated therewith. Other systems and methods are also disclosed.
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申请公布号 |
US2007281482(A1) |
申请公布日期 |
2007.12.06 |
申请号 |
US20060445669 |
申请日期 |
2006.06.02 |
申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
LENG YAOJIAN;DOKE NILESH S.;SMITH STANLEY M. |
分类号 |
H01L21/302;H01L21/461 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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