| 摘要 |
A sputter ion pump ( 1 ) has an improved magnet assembly comprising primary magnets ( 9 a, 9 b), disposed on opposite ends of the pump cells of an anode, and secondary magnets ( 11; 11', 11'' ) disposed on one side only of the pump cells, whereby the assembly exhibits an asymmetrical configuration. The sputter ion pump with the improved magnet assembly allows for attaining high pumping speeds even at low pressures with reduced size, weight and manufacturing cost of the pump itself.
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