| 摘要 |
<p>It is possible to provide a pattern forming method capable of reducing the resolution irregularities and concentration irregularities of a pattern formed on an exposed surface of a pattern forming material so as to effectively form the pattern with a high resolution. For this, a photosensitive layer of a pattern forming material formed on a support body is layered on a substrate to be treated. After this, an exposure head including light irradiation means and light modulation means having n plotting units arranged two-dimensionally and with the column direction of the plotting units at a set inclination angle R with respect to the scan direction is used for the photosensitive layer so as to execute: a step for specifying the use plotting units used for N-degree exposure by the plotting unit specification means for the exposure head; a step for controlling the plotting units by the plotting unit control means for the exposure head; and a step for relatively shifting the exposure head in the scan direction with respect to the photosensitive layer for performing exposure.</p> |
