发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND GLASS PATTERN FORMING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition and a photosensitive resin laminate having excellent adhesion to a glass substrate in hydrofluoric acid etching of the glass substrate. <P>SOLUTION: The photosensitive resin composition comprises (A) a binder resin having a carboxyl group content of 100-600 in terms of acid equivalent and a weight average molecular weight of 5,000-500,000, (B) a photopolymerizable monomer having at least one terminal ethylenically unsaturated group, (C) a photopolymerization initiator and (D) an organosilane compound, wherein the component (D) is a specific organosilane compound. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007316247(A) 申请公布日期 2007.12.06
申请号 JP20060144394 申请日期 2006.05.24
申请人 ASAHI KASEI ELECTRONICS CO LTD 发明人 ADACHI TERUHIKO
分类号 G03F7/075;G03F7/004;G03F7/033;G03F7/40;H01L21/027 主分类号 G03F7/075
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