发明名称 |
METHOD OF CREATING MEMS DEVICE CAVITIES BY A NON-ETCHING PROCESS |
摘要 |
MEMS devices (such as interferometric modulators) may be fabricated using a sacrificial layer that contains a heat vaporizable polymer to form a gap between a moveable layer and a substrate. One embodiment provides a method of making a MEMS device that includes depositing a polymer layer over a substrate, forming an electrically conductive layer over the polymer layer, and vaporizing at least a portion of the polymer layer to form a cavity between the substrate and the electrically conductive layer. Another embodiment provides a method for making an interferometric modulator that includes providing a substrate, depositing a first electrically conductive material over at least a portion of the substrate, depositing a sacrificial material over at least a portion of the first electrically conductive material, depositing an insulator over the substrate and adjacent to the sacrificial material to form a support structure, and depositing a second electrically conductive material over at least a portion of the sacrificial material, the sacrificial material being removable by heat-vaporization to thereby form a cavity between the first electrically conductive layer and the second electrically conductive layer. |
申请公布号 |
WO2007078495(A3) |
申请公布日期 |
2007.12.06 |
申请号 |
WO2006US45925 |
申请日期 |
2006.11.30 |
申请人 |
QUALCOMM INCORPORATED;WANG, CHUN-MING;LAN, JEFFREY;SASAGAWA, TERUO |
发明人 |
WANG, CHUN-MING;LAN, JEFFREY;SASAGAWA, TERUO |
分类号 |
B81B3/00;G02B26/00;G02B26/08 |
主分类号 |
B81B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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