| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an atmospheric pressure plasma processing device which prevents deposition of a processing residue at the electrode end part. <P>SOLUTION: The plasma processing device includes a plasma generating part having a pair of narrow and long electrodes 10-1, 10-2 which extend in orthogonal direction to transfer direction of a treating object 1 with a prescribed interval so as to interpose the treating object transferred and dielectric parts 12-1, 12-2 to cover the pair of electrodes 10-1, 10-2. The pair of electrodes 10-1, 10-2 are provided with a taper part at both ends in which the distance to the treating object 1 becomes wider the closer it comes to the end. <P>COPYRIGHT: (C)2008,JPO&INPIT |
