| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing an embossing roll for molding an antireflection film which is advantageous for producing an embossing roll for molding an antireflection film having no nodule defect. <P>SOLUTION: A working layer 15 is formed on an iron roll 11 having a shaft by copper electrodeposition plating. The polishing side of the working layer 15 is subjected to blast treatment for 4 h by using silicon carbide (which is) 50-150 μm in particle size to form fine unevenness in the surface of the working layer 15. A nodule defect generated on the surface of the working layer 15 is examined and removed by being irradiated with laser beams 22 from a laser beam machine 21. The surface is subjected to chromium electrodeposition plating to form a chromium layer (which is) about 10 μm in thickness to protect the surface. The surface of the protective plating layer 16 is examined. Before the chromium plating, the residual nodule defect is irradiated with laser beams 22 from the laser beam machine 21 to be removed. <P>COPYRIGHT: (C)2008,JPO&INPIT |
