发明名称 PATTERN FORMATION METHOD, DROP JETTING DEVICE, AND CIRCUIT MODULE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a pattern formation method reducing the formation failure of patterns consisting of drops by improving the drying efficiecy of the drops, to provide a drop jetting device and to provide a circuit module. <P>SOLUTION: The first irradiation light Le1 along the approximate scanning direction is irradiated to a first irradiation position P1 of liquid membrane FL by reflecting a laser light emitted from a semiconductor laser LD against a reflective mirror 27 mounted on a carriage 20. Then, the second irradiation light Le2 along the approximate scanning direction is irradiated to the second irradiation position P2 of the liquid membrane FL again by reflecting the reflective diffuse light Lr from the first irradiation position P1. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2007313499(A) 申请公布日期 2007.12.06
申请号 JP20070032513 申请日期 2007.02.13
申请人 SEIKO EPSON CORP 发明人 MIURA HIROTSUNA
分类号 B05D3/06;B05C5/00;B05C9/12;B05D1/26;H01L23/12 主分类号 B05D3/06
代理机构 代理人
主权项
地址