| 摘要 |
A shot shape measuring method comprising the step of sequentially exposing main-scale marks (32) onto a substrate according to a specified arrangement and forming a reference lattice consisting of a plurality of main-scale marks (32) disposed in a specified arrangement in at least one shot area on the substrate, the step of exposing to the substrate, via a projection optical system, a shot to be measured having a plurality of vernier marks (34) disposed in a specified arrangement in a shot area, the step of measuring the relative positional relation between adjacent main-scale marks (32), the step of measuring a deviation amount between a main-scale mark (32) and a vernier mark (34), and the step of correcting a reference lattice based on the relative positional relation and calculating the shot shape of a shot to be measured from a corrected reference lattice and a deviation amount. |
