| 摘要 |
An electron beam writing data creating method for creating writing data used for electron beam lithography includes judging whether resizing process need to be performed to a figure cell in device pattern data by cell base design or not, the figure cell including a cell layout frame and a pattern in the cell layout frame, performing the resizing process to the figure cell based on a relationship between the cell layout frame and the pattern, and resizing quantity of the resize process in a case where the resizing process is judged need to be performed to the figure cell, creating a character pattern cutting frame from the cell layout frame, and extracting a figure in the character pattern cutting frame as a character pattern.
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