| 摘要 |
<p>A lithography apparatus and a method for manufacturing a device are provided to improve robustness and wear resistance of an article support member by doping cordierite with LiNbO3 and/or ZrO2. The lithography apparatus includes an illuminator(IL), a mask table(MT), a wafer table(WT), and a projection system(PS). The illuminator is configured to condition a radiation beam(B). The mask table is configured to a patterning device(MA) and coupled to a first position setting unit(PM) being configured to accurately locate the patterning device according to parameters. The wafer table is configured to support a substrate(W) and coupled to a second position setting unit(PW) being configured to accurately locate the substrate according to parameters. The projection system is configured to project a pattern given to the radiation beam by the patterning device on a target section of the substrate. An article support member is made of cordierite. The cordierite is doped with LiNbO3 and/or ZrO2. A wear resistance section of the article support member has fracture toughness of 1.5 MPam^1/2 over and is made of parts of LiNbO3 and/or ZrO2.</p> |
