PROCESSING APPARATUS FOR DISPLAY SUBSTRATE

摘要

A display substrate processing apparatus is provided to realize a plasma space symmetric to all directions by positioning additionally a second switch for opening and closing a connection path inside of a main chamber except for a first switch. A display substrate is loaded to a transfer chamber(200). A main chamber(300) performs a plasma process to the display substrate. A connection part(400) offers a connection path for transferring the display substrate by connecting the main chamber with the transfer chamber. A first switch(600) opens and closes the connection path of the main chamber from the outside. A second switch(500) opens and closes the connection path of the main chamber from the inside.