METHOD FOR FORMING NANO RODS USING A CHEMICAL VAPOUR DEPOSITION APPARATUS FOR FABRICATING NANO RODS AND NANO RODS OR NANO WIRES MANUFACTURING THE SAME

摘要

A method for forming nano rods using a chemical vapor deposition apparatus for fabricating nano rods is provided to produce nano devices with a large-size, uniform monolayer and multilayer structure. A chemical vapor deposition apparatus(200) for fabricating nano rods includes a mixed gas reaction heat source part(11) which supplies a heat source for causing a reaction of the reaction gases containing reactant gases, and a nano material-forming heat source part(12) which supplies a heat source for growing nano particles as a base so as to grow nano rods on the substrate through the reaction gases, in order to inject a gasified semiconductor material into a chamber to form nano rods on a substrate(21), wherein the chamber is divided into a reactant gasification region(C1), a mixed gas reaction region(C2), and a nano material-forming region(C3) affected by the each heat source part. A method for forming nano rods using the chemical vapor deposition apparatus includes the steps of: forming nano particles by temperature of a heat source supplied by the nano material-forming heat source part while the reaction gases pass over the substrate; subsequently forming a seed layer; and forming vertically upward nano rods on the seed layer spontaneously.