SUBSTRATE TERMINAL CLEANING APPARATUS AND SUBSTRATE TERMINAL CLEANING METHOD

摘要

A substrate terminal cleaning apparatus which performs cleaning of a terminal section of a substrate by having a cleaning member abut to the terminal section. The substrate terminal cleaning apparatus is provided with a first supporting section for supporting the cleaning member at a first position; a second supporting section for supporting the cleaning member at a second position; a cleaning head section for applying pressure to a part of the cleaning member, which is being supported between the first position and the second position, by having the part of the cleaning member abut to the terminal section of the substrate; a supporting section moving apparatus for integrally moving the first supporting section and the second supporting section in a direction along the terminal section; and a cleaning head moving apparatus for moving the cleaning head section in the direction along the terminal section, at a second moving speed different from a first moving speed at which the supporting section moving apparatus moves the first supporting section and the second supporting section.