发明名称 |
Extracting method of pattern contour, image processing method, searching method of pattern edge, scanning method of probe, manufacturing method of semiconductor device, pattern inspection apparatus, and program |
摘要 |
An extracting method of a pattern contour, includes acquiring an image of a pattern to be inspected, calculating a schematic edge position of the pattern from the image, preparing an approximate polygon by approximating a polygon consisting of edges having predetermined direction components to a contour shape of the pattern on the basis of the calculated edge position, dividing the approximate polygon into star-shaped polygons, calculating the position of a kernel of the star-shaped polygon, and searching an edge of the pattern in a direction connecting the kernel to an arbitrary point positioned on the edge of the approximate polygon.
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申请公布号 |
US7305116(B2) |
申请公布日期 |
2007.12.04 |
申请号 |
US20030644001 |
申请日期 |
2003.08.20 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
IKEDA TAKAHIRO |
分类号 |
G01B11/00;G06K9/00;G01B11/24;G06T1/00;G06T5/00;G06T7/60;H01L21/66 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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