发明名称 APPARATUS AND METHOD FOR PRODUCING CARBON FILM USING PLASMA CVD AND CARBON FILM
摘要 [Problems] To provide a method for forming a carbon film homogeneously at a low cost and in a low power consumption. [Means for Solving the Problems] This carbon film forming method comprises the step of arranging a cylindrical member having an opening at its portion, in a vacuum chamber, the step of arranging a substrate in the cylindrical member, the step of introducing a carbon film forming gas into the vacuum chamber, and the step of applying a plasma generating voltage to the cylindrical member, to generate a plasma in the cylindrical member thereby to form the carbon film on the surface of the substrate by that plasma.
申请公布号 KR20070114327(A) 申请公布日期 2007.12.03
申请号 KR20057023130 申请日期 2005.10.13
申请人 DIALIGHT JAPAN CO., LTD. 发明人 HABA MASANORI
分类号 C23C16/26 主分类号 C23C16/26
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