| 摘要 |
A method for manufacturing an image sensor is provided to improve focusing property of a micro lens by using a light transmission unit having a width being increased from an edge of a color filter to a center thereof. First to third photo diodes(22,32,42) and first to third color filters(74,76,78) corresponding thereto are formed. A planarization layer covering the first to third color filters is formed to form a photo diode structure(50). A photoresist film(80) including photoresist material is formed on an upper surface of the planarization layer. The photoresist film is firstly exposed with a first exposure energy by using a first pattern mask(90) to form a first exposing unit(82). A first light transmission unit(92) having a first width is formed on the first pattern mask. The first width is formed, corresponding to a boundary of the first and second color filters and a boundary of the first and second color filters. The photoresist film is secondly exposed with a second exposure energy smaller than the first exposure energy by using a second pattern mask. A second light transmission unit having a second width larger than the first width is formed on the second pattern mask. The second exposing unit is overlapped with the first exposing unit. The second width is formed, corresponding to the boundary of the first and second color filters and the boundary of the second and third color filters. The photoresist film on which the first and second exposing units are formed is developed to form a micro lens.
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