METHOD FOR FABRICATING SELF ASSEMBLED DUMMY PATTERN FOR SEMICONDUCTOR DEVICE BY USING CIRCUITRY LAYOUT

摘要

A method for fabricating a self assembled dummy pattern for semiconductor device by using a circuitry layout is provided to generate automatically a dummy pattern by applying a self shape of a semiconductor device circuit. A design process is performed to design an original circuitry layout(390). An inverse layout forming process is performed to obtain an inverse layout of the original circuitry layout. A reduced layout forming process is performed to obtain a reduced layout of the inverse layout. A layout of a self assembled dummy pattern is obtained from the original circuitry layout by using an outline of the reduced layout and a predetermined line width. The layout of the self assembled dummy pattern is coupled with the original circuitry layout. A coupled layout(590) is transferred onto a semiconductor substrate.