发明名称 DUAL ULTRAVIOLET IRRADIATION EQUIPMENT
摘要 <p>A dual UV(Ultra Violet) irradiating apparatus is provided to perform UV irradiation on various sized wafers by changing a scan range of the UV irradiation according to size of the wafers using a wafer feeding rail. Plural loader units load a wafer cassette. Plural transfer units transfer the wafer cassettes loaded into the loader unit to an entrance of a UV irradiation region. Plural grippers receive/withdraw the wafer in the wafer cassette transferred to the entrance of the UV irradiation region into/out the UV irradiation region. A UV irradiation unit irradiates UV light to two wafers received in the UV irradiation region at one time. The transfer units are respectively driven by using a sub-motor. The UV irradiation region includes a wafer feeding rail. The wafer feeding rail controls a width thereof according to size of the received wafer to guide it.</p>
申请公布号 KR100780695(B1) 申请公布日期 2007.11.30
申请号 KR20060138468 申请日期 2006.12.29
申请人 HYNIX SEMICONDUCTOR INC. 发明人 LEE, HWA SEOB;KOH, KWANG DUCK;LEE, JUM DONG;SHIN, JAE MOO
分类号 H01L21/677 主分类号 H01L21/677
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