发明名称 |
DUAL ULTRAVIOLET IRRADIATION EQUIPMENT |
摘要 |
<p>A dual UV(Ultra Violet) irradiating apparatus is provided to perform UV irradiation on various sized wafers by changing a scan range of the UV irradiation according to size of the wafers using a wafer feeding rail. Plural loader units load a wafer cassette. Plural transfer units transfer the wafer cassettes loaded into the loader unit to an entrance of a UV irradiation region. Plural grippers receive/withdraw the wafer in the wafer cassette transferred to the entrance of the UV irradiation region into/out the UV irradiation region. A UV irradiation unit irradiates UV light to two wafers received in the UV irradiation region at one time. The transfer units are respectively driven by using a sub-motor. The UV irradiation region includes a wafer feeding rail. The wafer feeding rail controls a width thereof according to size of the received wafer to guide it.</p> |
申请公布号 |
KR100780695(B1) |
申请公布日期 |
2007.11.30 |
申请号 |
KR20060138468 |
申请日期 |
2006.12.29 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
LEE, HWA SEOB;KOH, KWANG DUCK;LEE, JUM DONG;SHIN, JAE MOO |
分类号 |
H01L21/677 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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